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A Powder-Based Target Physical Vapour Deposition Apparatus

Potential Commercialised fa-solid fa-cart-arrow-down violet
Reg. ID : 16666
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Description

The present invention relates to a physical vapour deposition apparatus for depositing substantially uniform coatings on a substrate, comprising: a deposition chamber; a rotary shaft disposed at centre of said deposition chamber; a substrate holder coupled to the rotary shaft, for holding the substrate; a heater coupled to the rotary shaft above the substrate holder, for heating the substrate; a magnetron assembly for sputtering of electron ions on a deposit; a pump, for generating and providing a vacuum-like atmosphere in the physical vapour deposition apparatus; and characterised by: a shutter positioned above the magnetron assembly for controlling exposure of a coating material to an ion bombardment; the magnetron assembly comprises of a first magnet stack positioned in centre of said magnetron assembly; a second magnet stack positioned at periphery of said magnetron for enhancing electrons during deposition; a cooling block; an insulator; and a power supply means.

Contact Person/Inventor

Name Email Contact Phone
Um Centre Of Innovation And Enterprise (Umcie) umcie@um.edu.my 013-2250151 / 03-79677351

Intellectual Property

Type of IP Registration ID
1 Patent Filed PI 2018703705

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