Method for Forming Monolayer or Multilayer Graphene)
Potential Commercialised
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Reg. ID : 17049
Comments
Description
The present invention discloses a method for forming one or more layers of graphene on one or more target substrates, wherein the method comprises the steps of: heating the one or more target substrates to a first predetermined temperature and heating a coiled resistive heating metal wire to a second predetermined temperature within a deposition chamber; generating a plurality of energetic ions for bombarding the heated coiled resistive heating metal wire to deposit metal nanoparticle catalyst on the one or more target substrates; heating the coiled resistive heating metal wire to a third predetermined temperature while maintaining the temperature of the one or more target substrates at the first predetermined temperature; and decomposing a source of precursor gases that is introduced into the deposition chamber by the heated coiled resistive heating metal wire for forming a plurality of active radicals to react with the metal nanoparticle catalyst deposited on the one or more target substrates, thereby forming the one or more layers of graphene on the one or more target substrates.
Contact Person/Inventor
Name | Contact Phone | |
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Um Centre Of Innovation And Enterprise (Umcie) | umcie@um.edu.my | 013-2250151 / 03-79677351 |
Intellectual Property
№ | Type of IP | Registration ID |
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1 | Patent Filed | PI 2011700043 |
Award
Award Title | Award Achievement | Award Year Received |
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0 | 0 | 0 |
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